HOT PLATE KW-4AH

CHEMAT TECHNOLOGY, INC. has designed and manufactured a compact and easy-to-use hotplate, Model KW-4AH, for baking and curing thin films and coatings. Its rugged, portable design, and temperature uniformity make it a versatile tool for research facilities. In conjunction with KW-4A spin coater, KW-4AH hotplate can be used to fabricate metal oxide thin films, polymer coatings and metal organic thin films.

Specifications  Options:
Operation: Manual Load
Process Control: Program
Temperature Resolution: 1oC
Temperature Range: 50-350oC
Substrate Size: 6 inch